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    產品簡介

    ASML’s PAS 2500/40 stepper with a well proven Zeiss 0.40NA i-line lens with a 21.1mm image field diameter. PAS 2500/40 stepper has been designed for 0.7micron production resolutions using a “process in-depended” alignment system, for a superior production overlay., makes the system a well proven workhorse.
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    ASML PAS2500/40 i-line晶片步進器的主要參數:

    • Lens resolution 0.7 micron i-line (365nm)

    • Reduction 5X

    • Field size 21.2 mm dia ( Xmax= 15mm, Ymax= 19mm )

    • UDOF 2.1micron ( Slope > 83 degrees )

    • Uniformity ± 3%

    • Intensity 200 - 420 mW/c㎡ (PEP option depended)

    • Reticles 6 (5”), automatic exchange and masking

    • Wafers 100, 125, 150 mm

    • Overlay (99.7% of data)
      single machine < 150 nm
      mach. to ref. mach < 250 nm
      mach. to mach < 300 nm

    • Throughput at 100 mJ/cm
      6”, 55 exp. 47 - 70 WPH (PEP option depended )
      5”, 35 exp. 60 - 89 WPH(PEP option depended )
      4”, 21 exp. 74 – 109 WPH(PEP option depended )

    • 咨詢專線

      +86 21 67693080

    • 郵箱

      sales@simaxat.com

    矽萬(上海)半導體科技有限公司
    地址:上海市松江區泗磚南路255弄130號
    微信公眾號

    版權所有 ?2021 矽萬(上海)半導體科技有限公司 滬ICP備18039044號-1

    滬公網安備 31011702008159號

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